FDC系统在PECVD设备管理中的应用研究

Intelligent Control of Plasma Enhanced Chemical Vapor Deposition Reactor on Industrial Scale

针对液晶显示领域等离子增强化学气相沉积(PECVD)设备原理和结构,构建基于FDC(Fault Detection&Classification)系统的PECVD设备智能化管理模式。通过FDC系统收集PECVD的设备和工艺参数,进行参数的相关性分析并设置监控模型,实时监控关键参数,智能输出锁定异常设备,提升PECVD设备智能化管理水平。

We reported the intelligent control of the plasma enhanced chemical vapor deposition(PECVD)reactor in fabrication of thin film transistor liquid crystal display(TFT-LCD)device on industrial scale.Based on Fault Detection&Classification(FDC)solution and trouble-shooting experience,the self-developed control unit comprised four key subunits:including the subunits of RF power supply,flow-rate of reactive gases,time evolution of pressure distribution in film-growth stages,and auxiliary equipment,such as the transport/heating/remote-cleaning of substrate and etc.The newly-developed control unit was tested in production line.The preliminary results show that the novel intelligent control unit works pretty well.For example,it is capable of monitoring the film growth conditions in real-time,intelligently locating abnormal equipment/faulty-parts,increasing efficiency/service life,and enhancing rate of finished products in fabrication of TFT-LCD devices.