弧光放电氩离子清洗源

The cleaning sources with argon ions using vacuum arc discharge technology

弧光放电氩离子清洗源是提高膜基结合力的新技术。由空心阴极枪、热丝弧枪、阴极电弧源发射的高密度弧光电子流把氩气电离,用得到的高密度的氩离子流清洗工件。工件偏压200V以下,工件偏流可以达到10A-30A,弧光放电氩离子流密度大,对工件的清洗效果好。本文介绍了几种配置弧光放电氩离子清洗源的电弧离子镀膜机和磁控溅射镀膜机。

The cleaning sources with argon ions using vacuum arc discharge technology are new methods to improve the adhesive strength between top layer and substrate, where electrons coming from arc discharge plasma by hollow cathode gun, heater filament gun and vacuum cathode arc sources produce argon ions and then the argon ions were used to clean the samples before coating process. With the help of this technology, bias currents on substrate holder can reach between 10 A and 30 A under the condition of bias voltages of only 200 V. This new clean method has great advantage, since it brings the high ion density. The article also gives a brief introduction on the vacuum arc deposition systems and magnetron sputtering system with this advanced Ar+cleaning sources.