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Preparation and characterization of ultrananocrystalline diamond films in H_2/Ar/CH_4 gas mixtures system with novel filament structure 被引量:1

Preparation and characterization of ultrananocrystalline diamond films in H_2/Ar/CH_4 gas mixtures system with novel filament structure
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摘要 Diamond films were prepared by hot filament chemical vapor deposition(HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp3-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp3-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems(MEMS). Diamond films were prepared by hot filament chemical vapor deposition(HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp3-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp3-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems(MEMS).
出处 《Journal of Central South University》 SCIE EI CAS CSCD 2015年第11期4097-4104,共8页 中南大学学报(英文版)
基金 Projects(51301211 21271188)supported by the National Natural Science Foundation of China Project(ZZ13005)supported by the Foundation of Laboratory of Ultra Precision Manufacturing Technology of China Academy of Engineering Physics Project(2010A0302013)supported by Research Foundation of China Academy of Engineering Physics Project(2012M521541)supported by the China Postdoctoral Science Foundation Project(20110933K)supported by the State Key Laboratory of Powder Metallurgy(Central South University),China Project(CSU2013016)supported by the Open-End Fund for Valuable and Precision Instruments of Central South University,China
关键词 ultrananocrystalline DIAMOND HOT FILAMENT CHEMICAL ultrananocrystalline diamond hot filament chemical
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  • 1Anirudha V. Sumant,Orlando Auciello,Meiyong Liao,Oliver A. Williams.MEMS/NEMS based on mono-, nano-, and ultrananocrystalline diamond films[J]. MRS Bulletin . 2014 (6)
  • 2Jonathan Cebik,John K McDonough,Filipe Peerally,Rene Medrano,Ioannis Neitzel,Yury Gogotsi,Sebastian Osswald.Raman spectroscopy study of the nanodiamond-to-carbon onion transformation Dedicated to Professor Maurizio Prato on the occasion of his 60th birthday.[J]. Nanotechnology . 2013 (20)
  • 3S.-T. Chen,Y.-C. Chu,C.-Y. Liu,C.-H. Huang,Y. Tzeng.Surface-enhanced Raman spectroscopy for characterization of nanodiamond seeded substrates and ultrananocrystalline diamond at the early-stage of plasma CVD growth process[J]. Diamond & Related Materials . 2012
  • 4Orlando Auciello,Anirudha V. Sumant.Status review of the science and technology of ultrananocrystalline diamond (UNCD?) films and application to multifunctional devices[J]. Diamond & Related Materials . 2010 (7)
  • 5Y.S. Zou,Z.X. Li,Y.F. Wu.Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH 4 /H 2 /Ar by microwave plasma chemical vapor deposition[J]. Vacuum . 2010 (11)
  • 6Anirudha V. Sumant,Orlando Auciello,Robert W. Carpick,Sudarsan Srinivasan,James E. Butler.Ultrananocrystalline and Nanocrystalline Diamond Thin Films for MEMS/NEMS Applications[J]. MRS Bulletin . 2010 (4)
  • 7Xingbo Liang,Lei Wang,Hongliang Zhu,Deren Yang.Effect of pressure on nanocrystalline diamond films deposition by hot filament CVD technique from CH 4 /H 2 gas mixture[J]. Surface & Coatings Technology . 2007 (2)
  • 8V. P. Varnin,V. A. Laptev,V. G. Ralchenko.The state of the art in the growth of diamond crystals and films[J]. Inorganic Materials . 2006 (1)
  • 9P.W. May,J.A. Smith,Yu. A. Mankelevich.Deposition of NCD films using hot filament CVD and Ar/CH 4 /H 2 gas mixtures[J]. Diamond & Related Materials . 2005 (2)
  • 10Shr-Ming Huang,Franklin Chau-Nan Hong.Low temperature growths of nanocrystalline diamond films by plasma-assisted hot filament chemical vapor deposition[J]. Surface & Coatings Technology . 2005 (10)

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