摘要
MOPA(MasterOscillator&PowerAmplifier)是采用双腔技术的准分子光源,它的成功量产将向光刻工厂提供前所未有的光谱带宽性能和输出功率,并大大降低成本,而且还适用于所有DUV曝光波长。
The successful productization of MOPA(master oscillator power amplifier)dual-chamber tech-nology for excimer light sources will provide lithographers with unprecedented levels of spectral bandwidth performance,output power generation and cost savings for all DUV exposure wavelengths
出处
《电子工业专用设备》
2004年第2期15-18,共4页
Equipment for Electronic Products Manufacturing
