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先进ATHENA^(TM)选用策略与对准功能(英文)

Overlay Performance with Advanced ATHENA^(TM) Alignment Strategies
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摘要 基于先进科技对准规格的减缩,对准仪量测数据的应用也变得更为重要。不同对准策略的选择所引起的结果,对全部对准预算有很重要的影响。介绍两个主要科技研发项目:先进对准配套和对准标的设计。 To comply with the tightening overlay roadmap,processing effects on overlay need to be reduced to a minimum.For this purpose,ASML has developed the ATHENATM alignment sensor.This phase grat-ing alignment system detects up to seven orders that are diffracted by an alignment grating.Since these higher diffraction orders are less sensitive to mark deformations,alignment has become more accurate and more robust to processing variations.In addition,the robustness for situations where destructive interfer-ence or absorption impacts the signal strength is enhanced by incorporating two wavelengths in the align-ment system:red and green with wavelengths of633and532nm,respectively.Thus,the sensor provides in total14signals per alignment mark to perform a wafer alignment.
出处 《电子工业专用设备》 2004年第2期28-35,共8页 Equipment for Electronic Products Manufacturing
关键词 对准系统 多组光栅标 化学机械抛光 晶圆对位 Alignment system VSPM CMP Wafer alignment
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