摘要
在H2 O2 H2 SO4体系中添加适量添加剂 ,研究成功一种新的环保型铜及铜合金化学抛光液 ,探讨了各成份的影响 ;溶液无毒对环境无污染 ,溶液维护简单 ,抛光效果好。
A new environment-friendly chemical polishing solution for copper and its alloys has been successfully developed by adding a suitable amount of additive to H 2O 2-H 2SO 4 system. The effects of each component are discussed. The solution is nontoxic, with no contamination on environment, and easy in maintenance, good in polishing effect.
出处
《电镀与环保》
CAS
CSCD
2004年第1期31-32,共2页
Electroplating & Pollution Control
关键词
添加剂
铜
合金
化学抛光
稳定
环境保护
Chemical polishing
Copper and its alloy
Environmental protection
Stabilization
