离子源辅助磁控溅射Cu基镀Cr层机械性能研究

Mechanical Study Cr Films on Cu Substrate Deposited by Ion Source Assisted D.C Magnetron Sputtering

采用离子源辅助直流磁控溅射在不同表面粗糙度的铜基上制备铬膜,通过显微金相仪对膜层表面硬度的测量、划痕法对铬膜附着力的测量、扫描电镜对界面和表面形貌的观察,分析了铜基表面铬膜的机械性能。研究表明,同其他镀膜方式相比,运用离子源辅助直流磁控溅射方法在纯铜基体上镀制铬膜,其附着性达6 N以上;硬度相比未加离子源辅助提高约10%;膜厚对铜基铬膜机械性能的影响不大;SEM结果显示膜、基界面结合良好,基体表面上一定尺寸的微粗糙结构有利于提高铬膜机械性能。

The chromium(Cr) thin films were deposited by ion source assisted D.C magnetron sputtering on copper substrate that has different surface roughness.The mechanical properties of Cr films were studied by SEM study,micro metal phase analysis and scratch adhesion test.The results showed that the Cr films prepared by ion source assisted D.C magnetron sputtering have superior adhesion ability of 6 N contrast with non-ion source assisted method.The surface rigidity has a distinct increase by 10%.The thickness of Cr film has little effect on the mechanical properties.SEM tests show that the interface of Cr/Cu is well adjoined and there exists a clear boundary,which means some micro roughness of substrate surface may improve the mechanical properties such as surface coating rigidity and adhesion of Cr films.