大面积纳米金刚石薄膜的制备及场发射性能

Preparation and field emission properties of large area nanocrystalline diamond films

以CH4和H2为反应气,采用微波等离子体增强化学气相沉积方法在直径为10 cm的硅原片上制备纳米金刚石薄膜。用X射线衍射仪、拉曼光谱、扫描电镜和原子力显微镜对薄膜的组成结构及性能进行表征。结果表明:薄膜的平均晶粒尺寸约为13.8 nm,厚度可达10.8μm,表面粗糙度约为11.8 nm;其拉曼光谱是典型的纳米金刚石薄膜的特征峰峰形,同时在高真空条件下对所制备的薄膜样品进行场发射性能测试。

Nanocrystalline diamond (NCD) films were synthesized on the silicon substrate with diameter of 10 cm by microwave plasma enhanced chemical vapour deposition using CH4 and H2 as the reactant gas. The film composition and performance were characterized by X-ray diffractometry, Raman spectroscopy, scanning electron microscopy and atomic force microscopy, respectively. The results show that, the average grain size of the film is about 13.8 nm, the maximum thickness can reach 10.8μm and the surface roughness is 11.8 nm. The Raman spectrum is the typical characteristic peak shape of nanocrystalline diamond films, and the field emission properties were measured under high vacuum conditions.