摘要本文介绍电子元件的清洗工艺与非耗臭氧清洗材料的选择,以便达到保护臭氧层的目的。This paper introduces about the cleaning technology and non-ODS cleaning materials of the electronics components, resulting in protection of the ozone layer.
7Rothman L B,Robey R J,Ali M K,Mount D J.Supercritical fluid process for semiconductor device fabrication. Advanced semiconductor manufacturing. 2002 IEEE/SEMI conference and Workshop, 30, April-2 May 2002.
