电子束在不同介质界面附近剂量跃变的蒙特卡罗模拟

Accurate Monte Carlo Simulation of Electron Energy Deposition in Extended Media

在许多辐射剂量的应用中,都会涉及到如何精确地计算两种介质界面附近的剂量问题.作者用不同的多次散射模型,对多种介质界面附近的剂量跃变进行了蒙特卡罗模拟,并与相应的实验结果进行比较,研究了使用不同的多次散射模型对计算结果的影响.

Energy deposition near the different media play an important role in many applied aspects of radiation dosimetry.Energy deposition in extended media(Al-Au, Cu-polystyrene, Be-Au-Be) is calculated with different multiple scattering (MS) of electrons models by Monte Carlo method respectively. The simulation results match the experiment acceptable well and show the differences caused by the MS models used.