摘要
采用反应蒸镀法镀制了单层ＨｉＯ２薄膜，观察了薄膜表面主要的微结构缺陷， 研究了基片清洗工艺对薄膜损伤阈值的影响。测量了薄膜沉积前后表面粗糙度变化。结果表 明：沉积工艺可以改变粗糙度，并对薄膜抗激光损伤能力有较大的影响。
A series of films were prepared by reactive evaporation. The microstructure defects on film surfaces and effect of substrate cleaning procedures on laser induced damage threshold were investigated. The RMS surface roughness of uncoated and coated substrates were measured. It was shown that the coating process could increase or decrease the surface roughness and had obvious effects on damage threshold.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2001年第1期31-33,共3页
High Power Laser and Particle Beams
基金
中国工程物理研究院科技基金资助项目!(980230)
关键词
HFO2
薄膜
表面粗糙度
激光损伤
Coatings
Defects
Evaporation
Film preparation
Laser damage
Microstructure
Substrates
Surface roughness
Thin films
