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充等离子体微波源高压电源的撬棒保护 被引量:3

Crowbar circuit protection of high voltage power supply of plasma filled HPM source
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摘要 充等离子体高功率微波源 PASOTRON的高压直流电源工作电压为 -70 k V~-1 50 k V、电流为 30 0 A左右 ,而调制器又悬浮于此高压上工作 (电流为 60 A,脉宽 60~ 1 2 0 μs)。在工作中 ,一旦出现管子打火 ,很容易打坏管子、高压直流电源、调制器或控制柜的电路模块。因此 ,其控保系统就显得尤为重要。为此采用一种专门研制的高压撬棒 ,利用简单的自触发电路 ,达到了满意的保护效果。实验证明 ,从管子打火到撬棒管作出分流仅滞后 1 50 ns,可以分流掉滤波电容中 98%以上的储能 。 The operation voltage of high voltage DC power supply of plasma filled high power microwave source PASOTRON is from -70kV up to -150kV, the total current is about 300A, while the modulator(current 60A, pulse width 60~120μs) is operating suspended on the HV DC. In practice, if the strike arc occurs, there is a strong potential to destroy the microwave tube, high voltage DC power supply, modulator or/and modular circuit of the system. The protection system of the power supply, therefore, plays an important role in the operation of system. The special designed HV crowbar and a simple self triggering circuit is applied, and a satisfied protection result is achieved. The experiments show that, 98% of the energy of the filtering capacitor would be bypassed by the crowbar after 150ns of the strike arc.
出处 《强激光与粒子束》 EI CAS CSCD 北大核心 2001年第3期338-340,共3页 High Power Laser and Particle Beams
基金 国家 8 6 3高技术 电子部军事预研资助 四川省跨世纪人才工程项目资助课题
关键词 撬棒 PASOTRON 调制 crowbar PASOTRON modulation
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  • 1V. L. Bratman,G. G. Denisov,B. D. Kol’chugin,S. D. Korovin,G. D. Polevin,V. V. Rostov. Powerful millimeter-wave generators based on the stimulated Cerenkov radiation of relativistic electron beams[J] 1984,International Journal of Infrared and Millimeter Waves(9):1311~1332

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  • 1戴广明,孙荣棣,钮惠平.自触发撬棒电路[J].现代雷达,2005,27(3):65-66. 被引量:3
  • 2魏合林,刘祖黎.直流空心阴极放电中鞘层区电子的输运过程[J].物理学报,1994,43(6):950-957. 被引量:5
  • 3黄懿赟.用撬棒快速保护技术保护高功率微波管[J].高电压技术,2005,31(6):66-68. 被引量:5
  • 4Smith C R, Armstrong C M, Duthie J. The Microwave Power Module:A Versatile RF Building Block for High-Power Transmitters[J]. Proceeding of the IEEE, 1999,87(05):717-737.
  • 5Shang W, Damstra G C. The Properties of Triggered Vacuum Gaps[J3. IEEE Transaction on Electrical Insulation, 1993, 28(04): 650-656.
  • 6Kenchtli R C I.Hollow cathode gas discharge device:U S Patent,3831052[P].[2005-01-08].
  • 7Gebel D M,Schumacher R W,Watkins R M.Long pulse plasma cathode e-gun[C]//Proc 9th Int Conf on High-Power Particle Beams.Washington D C,1992:1093-1098.
  • 8Xie W K,Li X U,Meng L,et al.Experimental study of the plasma cathode electron gun[J].Int J of Infrared and Millimeter Waves,2002,23(8):1149-1158.
  • 9Gobel D M,Butler J M,Schumacher R W,et al.High current,low-pressure plasma-cathode electron gun:U S patent,5537005[P].[2005-01-08].
  • 10Gobel D M,Schumacher R W.High-power microwave source based on an unmagnetized backward-wave oscillator[J].IEEE Trans on Plasma Science,1994,22(5):547-553.

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