磁悬浮纳米级步进扫描工作台CAD/CAE设计研究

Research on Magnetic Levitation Nanometer Positioning Precision Stage With CAD/CAE

采用CAD/CAE技术手段设计了一种新型磁悬浮超精密工作台 ,它是针对微电子行业IC芯片制造设备如光刻机而研制的快速步进、精密定位机构。利用磁悬浮技术将工作台悬浮在X、Y导轨上 ,消除了导轨的摩擦和磨损 ;直线电机无接触驱动实现了工件台的精密定位。用UG软件 ,构造了磁悬浮工作台的三维实体模型 ,并进行了机构运动分析仿真 ;用ANSYS软件进行了磁悬浮系统的电磁场分析 ,可得到磁通量密度 ,磁场强度 ,磁力 ,以及能量损耗和漏磁量 ;对磁悬浮工作台进行了有限元力学分析和结论优化 ,并结合实验测试 ,可使工作台在X、Y方向能量满足 0 .0 2 μm的定位精度要求以及达到 0 .1μm调焦精度和 3.0 μrad调平精度的要求。

A new type of magnetic levitation stage is designed by means of CAD/CAE technology.Magnetic levitation precise stage is a new type precise mechanism which can locate the position fast and precisely.It is mainly applied to the manufacturing equipment of IC chips which are highly precise microelectronic facilities such as laser photolithography equipment.With the magnetic levitation technology the stage is suspended on the X&Y rails which are made of granite and SiC.There are no friction and wear abrasion on the rails.The stage is driven fast and precisely by linear motors with non-contact driving.By using CAD/CAM/CAE software UG,solid models of the magnetic levitation X-Y stage were built and the mechanism simulation was also done.With the help of soft ware ANSYS,the electromagnetic field analysis is made by using finite element method(FEM).Typical quantities of a magnetic analysis in the system of magnetic levitation are available such as Magnetic flux density,Magnetic field intensity,Magnetic forces,Power loss and Flux leakage.On the basis of electromagnetic field analysis and structure optimization combining with the measurements in experiment,the X-Y stage structure can meet the demand of 0.02 μm positioning accuracy in X axis and Y axis,0.1μm focusing accuracy and 3.0μrad leveling accuracy.