分子沉积(MD)膜表面形貌的测量及影响因素

Measurement of Topography for Molecular Deposition Films and its Influencing Factors

利用原子力显微镜 (AFM)考察了单层磺化酞菁铜 (CuTsPc)MD膜硅表面随载荷和扫描速率变化的盒维数 ,对单层CuTsPcMD膜硅表面进行了表面形貌的测量 ,并分析了形貌信息中的摩擦力信息对表面形貌信号的影响。结果表明 ,单层CuTsPcMD膜硅表面具有较好的分形几何特性 ,分形是表面的固有属性 ;不同类型的硅表面具有的盒维数基本不变。表面形貌的信息里包含的摩擦力信息是表面形貌测量中的重要影响因素 ,载荷和扫描速率通过影响摩擦力对表面形貌的测量产生影响 ,但载荷影响程度不大 ,且没有较明显的规律 ;扫描速率增加能引起表面粗糙度和表面高度的降低。

In this paper, fractal of monolayer copper phthalocyaninetetrasulfonic acid, tetrasodium salt (CuTsPc) molecular deposition (MD) film on Silicon substrate is studied with the increase of load and scan-rate by atomic force microscopy. At the same time, effect of frictional force on topographyis analyzedwhen topographyof monolayer CuTsPcmolecular deposition film is measured. Our work suggests that the above-mentionedMD film has the better fractal properties, which is natural. Differentsilicon surfaces(clean Si surface, hydroxylate silicon surface,aminopropylsilanized(APS) silicon surface, and Silicon surface deposited monolayer CuTsPc) havethe stable fractal. Topographyincluding frictional force information is measured, and it is found that frictional force has great effect on measurementof topography. In addition, load and scan-rate also influences measurementof topographybecause they can lead to change of frictional force.But load is not significant to measurementoftopography, and surface roughness and its height decreases when scan-rate increases.