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用一氧化二氮-乙炔火焰原子吸收光谱法测定镍基高温合金中硅 被引量:2

Atomic Absorption Spectrometry to Measure the Content of Silicon in High Temperature of Nickel Alloy
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摘要 本文运用了一氧化二氮-乙炔原子吸收光谱法测定镍基高温合金中的硅。介绍硅最佳测定条件以及呈良好线性范围的浓度。同时对干扰因素进行了综合考虑。该方法灵敏度高,干扰小,选择性和重现性好。同时具有方法步骤简单、操作容易掌握、分析周期短等优点。硅含量在1-50μg·ml-1范围内与吸光度呈良好的线性关系。测定样品中硅10-50μg·ml-1(n=6)时,其相对标准偏差均为1.0。标准加入回收率在97.0%-103.0%(n=6)范围内,适用于镍基高温合金中硅含量的分析。完全达到了实验室分析质量控制的要求。 The application of Nitrous oxide-ethane flame atomic absorbing spectral method to measure the content of silicon in High temperature of nickel alloy is studied. This paper introduces the optimum measuring conditions for silicon and potency in which a fine liner range presents, and makes a synthetic consideration to interference factors. The method has the advantages of high sensitivity, And this method is proved, to be simple operation, easy master, short analyzing cycle, Less interference and good in selectivity and reappearance (Silcon content in range of 1-50 μ g · ml-1 is well proportional to absorbance). The relative standard deviations are all less than 1.0% in six sample measures, and the standard adding recovery is the range of 97.0%-103.0% in six sample measures. The proposed method was proved to be a useful instrument analytical technique in nitrous oxide-ethane flame absorbing spectral method.
作者 薛光荣
出处 《上海计量测试》 2004年第1期15-17,共3页 Shanghai Measurement and Testing
关键词 一氧化二氮-乙炔 火焰原子吸收光谱法 测定 镍基高温合金 Silicon Nitrous oxide-ethane flame Atomic absorption Spectrophotometer High temperature of nickel alloy Analysis method
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参考文献5

  • 1[1]Cramer J M.Atomic absorption spectrometry.New York: Scientific Publishing Company, 1982 213~249
  • 2[2]Pearl C.Quantitative chemical Analysis.New York: Scien-tific Publishing Company, 1969 230~240
  • 3[5]Kellner R, Merment J.Chemical Analysis [M].VCH publi-shing Company.New York, 1995 155~266
  • 4[6]Ramakrisha T V.Anal Chim.Acta 37, 1967 56
  • 5[7]Fleming H D.Spectrochim.Acta 23B, 1967 199

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