摘要
通过改变UV照射时间、照射后的操作速度、光复活时的温度、时间和光强度,以光复活和暗处理后细胞存活数的比值为依据,研究了不同条件下E.coli受UV照射后的光复活效应。并以E.coli对5μg ml链霉素抗性突变率为指标,比较了不同剂量UV照射后光复活和暗处理对E.coli突变率的影响。结果表明:光复活效应在温度10℃时最明显,且与照射时间、照射后的操作速度、光复活时间和光强度成正相关;在中、低剂量UV照射后,暗处理较光复活后E.coli对链霉素抗性突变率明显高,而在高剂量下,光复活则显著高于暗处理后的突变率。
By varying UV radiation time, operating speed after radiation, temperature, time and luminous intensity while photoreactivating, the E.coli's photoreactive effect was studied based on the survival ratio of the cells being treated under light and dark after radiation. By taking the mutation rate of E.coli's resistance to 5μg/ml streptomycin as index, the effect of photoreactivation on the mutation rate of E.coli with different dose UV radiation was compared. The results showed that the photoreactive effect is the most significant under 10℃, and is positive relevance to radiation time, operating speed, photoreactivation time and luminous intensity, and that the mutation rate of dark treatment was significantly higher than photoreactivation when E.coli was radiated at medium or low UV dose, however,the result was reverse at high dose.
出处
《激光生物学报》
CAS
CSCD
2004年第1期8-12,33,共6页
Acta Laser Biology Sinica
关键词
光复活
紫外线
大肠杆菌
突变率
photoreactivation
ultraviolet ray
Escherichia coli
mutation rate