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反应磁控溅射工艺中的滞后效应研究 被引量:4

STUDY ON THE HYSTERESIS EFFECT IN THE REACTIVE MAGNETRON SPUTTERING TECHNICS
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摘要 研究了反应磁控溅射的动力学过程。理论分析与试验结果表明:反应气体流量随其压力的变化呈滞后效应,最佳镀膜工艺位于滞后区域。给出了金属靶阴极表面溅射清洗效果的伏安特性评价法,为克服"靶中毒"提供了有效的技术途径。 The kinetic process of reactive magnetron sputtering has been studied. Theoretical analysis and experimental results have showed that the mutual relationships between flow rates and partial pressures of reactive gases exhibiting hysteresis effect, and optimum plating technics locate in its hysteresis region.The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given,which provides effective approach to eliminate 'target poisoning'.
作者 常天海
出处 《真空与低温》 2003年第4期191-194,共4页 Vacuum and Cryogenics
关键词 反应磁控溅射 滞后效应 动力学 金属靶 伏安特性评价法 reactive magnetron sputtering kinetic process hysteresis effect
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  • 1朱圣龙,王福会,吴维畦.反应溅射动力学模型及应用的研究[J].中国表面工程,1998,11(2):19-21. 被引量:1
  • 2ZHU SHENGLONG, WANG HUFUI, WU WEITAO, et al. Computer simulation of reactive sputtering [J].International Journal of Materials and Product Technology, 2001, 1: 101~106.
  • 3ROUSSELOT C,MARTIN N. Hysteresis effect in D.C. and R.F. reactive magnetron sputterin[J]. Vide: Science,Technique et Applications, 1999, 54(294): 481~490.
  • 4ROUSSELOT C,MARTIN N. Modelling of reactive magnetron sputtering used for the deposition of thin films[J]. Le Vide Science and Technique and Applications, 1997, 284: 219~222.
  • 5BARANKOVA H,BERG S,CARLSSON P,et al. Hysteresis effects in the sputtering process using two reactive gases [J]. Thin Solid Films, 1995, 260(2): 181~186.

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