摘要
分析了确定基片架上最佳沉积区域的重要性,采用一种简单可行的试验方法,对ZZ-SX500型光学镀膜机的拱型基片架进行了研究,给出了试验方法的理论依据及实际应用结果,并对试验中的关键仪器即MKG-5型光电极值膜厚监控仪进行了可靠性评价试验。
The essentiality of determination on optimum deposited area of substrate support has been analysed. Using a experimental method, the arch sustrate support of ZZ-SX500 model optical plating machine hasbeen studied. Theoretical foundation and practical results of the experimental method have been given. The reliability evaluateing test on the key experimental instrument namely MKG-5 photoelectricity extremum model film thickness measuring-controling instrument has been conducted.
出处
《真空与低温》
2003年第4期217-220,共4页
Vacuum and Cryogenics
