Modification of the Properties of Cu_x S Thin Films by Low Energy Ion Beam Implantation
Modification of the Properties of Cu_x S Thin Films by Low Energy Ion Beam Implantation
摘要
Cu x S thin films are implanted by low energy N + ion beam. The influences of the energy and dose of N + ion implantation on Cu x S films are investigated. The results show that the ratio of copper to sulfur is increased to some extent, the constituents of the film are turned to rich copper phase from rich sulfurous phase after ion beam irradiation. X-ray diffraction spectrum and optical transmission spectra of sample have confirmed the results.
Cu x S thin films are implanted by low energy N + ion beam. The influences of the energy and dose of N + ion implantation on Cu x S films are investigated. The results show that the ratio of copper to sulfur is increased to some extent, the constituents of the film are turned to rich copper phase from rich sulfurous phase after ion beam irradiation. X-ray diffraction spectrum and optical transmission spectra of sample have confirmed the results.
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