期刊文献+

应用MBTC温控系统实现对扩散炉的先进工艺要求 被引量:2

Achieving Advanced Process Requirement of Diffusion?CVD Furnaces Using Model-Based Temperature Control
下载PDF
导出
摘要 说明了如何设计、开发及应用于扩散炉之MBTC温控系统以满足先进工艺需求。MBTC温控系统是由搭配H∞多变数控制设计法建构一模型表示温度与加热丝功率化的关系,以取代传统PID控制系统,并可提供更优异的温度控制、生产效率、工艺质量与投资回收率。 This paper describes the design,development and implementation of a model-based temperature control(MBTC)system to achieve the advanced process requirement in furnaces.This approach integrates thermal dynamic modeling of the furnace with robust H∞multivariable controller design to replace older PID control system while enabling easy conversion within a manufacturing environment.Results demonstrate excellent steady-state temperature control,virtually no overshoot,and improve run-to-run process uniformity.
作者 李彦斌
出处 《电子工业专用设备》 2004年第3期60-63,共4页 Equipment for Electronic Products Manufacturing
关键词 扩散 扩散炉 温度控制 Diffusion Furnace Temperature control
  • 相关文献

参考文献6

  • 1[1]S. Wolf and R. Tauber. Silicon Processing For the VLSI Era [C]. Volume 1: Process Technology. Lattice Press, Sunset Beach, CA, 1986.
  • 2[2]K. Tsakalis, K. Stoddarl. Integrated Identification and Control for Diffusion/CVD Fumaces[C]. 6th IEEE International Conference on Emerging Technologies and Factory Automation, Los Angeles,CA, Sept. 1997: 1234-1239.
  • 3[3]M. Yelverton, K. Stoddard, B. Cusson, T. Timmons. "Improving Diffusion Furnace Capability Using Model-Based Temperature Control in a Production Environment", 6th International Symposium on Semiconductor Manufacturing (ISSM), San Francisco, CA, Oct. 1997.
  • 4[4]K. Tsakalis, K. Stoddard. "Control Oriented Uncertainty Estimation in System Identification", 17th IASTED International Conference MIC, Grindelwald, Switzerland, Feb. 1998
  • 5[5]M. Tucker, E. Valdez, K. Taskalis, M. Warren, K. Stoddard."Improving Vertical Furnace Performance Using Modelbased Temperature Control", AEC/APC Symposium X,sponsored by SEMI/SEMATECH, Vail, Oct. 1998.
  • 6[6]M. Yelverton,B. Cusson,M.Simpson. "A Complete Fumace Control Platform for High-Volume Manufacturing", 7th International Symposium on Semiconductor Manufacturing (ISSM), Tokyo, Japan, Oct. 1998.

同被引文献2

引证文献2

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部