摘要
用工业型脉冲直流等离子体化学气相沉积(PCVD)设备,针对不同混合气体CH_4所占比例,在H13模具钢表面沉积了Ti(C,N)薄膜。用SEM观察薄膜断口形貌,用XRD及XPS分析薄膜相组成和价态。结果表明:一定量碳元素的加入,抑制了TiN薄膜中柱状晶的生长,并且阻止了TiN晶粒的长大。Ti(C,N)的相结构可能为TiN和TiC两相混合,但在C(或N)含量较低的膜层中,C(或N)原子也会以置换的方式存在于TiN(或TiC)单相组织中。
Using pulsed DC plasma chemical vapor deposition technology, the Ti(C, N) films on H13 steel were prepared under different CH4 atmospheres. The cross-sections of the Ti(C,N) films were investigated by SEM, and the elements in the film were characterized by XRD and XPS The results show that addition of C to TiN film prevents the growth of TiN grains and development of column structure. The Ti(C, N) can be composed of two phases of TiN and phase TiC.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2004年第2期204-206,共3页
Rare Metal Materials and Engineering
基金
国家"863"计划资助项目(2001AA883010)