摘要
利用射频磁控溅射技术,以Ar和O_2气混合气体为溅射气体在载玻片上制备了锐钛相TiO_2薄膜。为了提高TiO_2薄膜的光催化活性,在TiO_2薄膜表面进行了钽修饰。利用X射线衍射(XRD),原子力显微镜(AFM)和UV-VIS-NIR分光光度计等技术对薄膜进行了表征。结果表明:对TiO_2薄膜的表面进行适量的Ta元素修饰可以提高其光催化活性。
Anatase phase TiO2 thin films were prepared on microscope glass slides by r.f. magnetron sputtering using Ar and O-2 mixed gases. Then tantalum modified TiO2 thin film was obtained to improve its photocatalytic activity. The films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM) and UV-VIS spectrophotometer. The results indicated that using of proper quantity of Ta to modify the surface of TiO2 thin film can improve its photocatalytic activity.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2004年第2期125-127,共3页
Rare Metal Materials and Engineering
基金
Supported by the National Nature Science Foundation of China (59982002), The Foundation of Key Laboratory in University for Radiation Beam Technology and Materials Modification, Beijing Normal University
关键词
TIO2薄膜
表面修饰
光催化活性
TiO2 thin film
surface modification
photocatalytic activity
