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低磷化学镀镍层的组成和结构 被引量:7

COMPOSITION AND STRUCTURE OF THE LOW PHOSPHOROUS ELECTROLESS NICKEL COATING
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摘要 用SEM、XPS、AES和X-射线衍射法研究了低磷化学镀镍层的形貌、结晶状态、组成元素及其价态和深度分布。结果表明,低磷化学镀镍磷合金层为层状结构,镀态的镀层由低晶态的Ni和Ni_2P组成,350℃热处理1小时后转化为完全晶态的Ni和Ni_3P。镍和磷均为零价态,它们的结合能分别为129.1ev和852.3eV。镀层的真实组成(相对原子百分浓度)为:Ni 85.4%,P 10.1%,O 4.5%。 The morphology, crystalline state, composition elements and their depth, profile and valence state were studied by scannfing electron microscopy (SEMi), x-ray diffractometry (XRD) and electron spectrometry (XPS and AES). The result showed that the low phosphorous electroless nickel coating has a smooth lamellar structure, composed of Ni and Ni_2P of low crystalline state, but they were transformed into Ni and Ni_3P of complete crystalline state after heat treatment at 350℃ for 1h.The phosphorous and nickel in low phosphorous eleetroless nickel coating were in zero valance state, with binding energy being 129.1 eV and 852.3 eV respectively. The compositions(A.C.%) of the Ni-P coating were Ni 85.4%, P 10.1%, O 4.5% as obtained after the constant composition region of the AES depth profile curves of the Ni-P coating.
出处 《应用化学》 CAS CSCD 北大核心 1992年第5期34-38,共5页 Chinese Journal of Applied Chemistry
关键词 镍磷合金 镀层 化学镀镍 electroless nickel plating, Ni-P alloy, XPS, AES, XRD
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参考文献8

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二级参考文献1

  • 1方景礼.日本化学镀发展概况[J]电镀与环保,1986(03).

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