摘要
采用化学气相沉积(CVD)聚合工艺制备的对苯撑二甲基聚合物可广泛应用在航天、航空、军工、电子、生物医学工程、控制系统、文物保护、纳米材料和磁性材料等诸多领域。综述了聚对苯(撑)二甲基系列膜的化学气相沉积聚合工艺和原理,介绍了底物温度和沉积舱压力等主要因素对膜沉积率的影响和膜的一些主要性能,并讨论了典型的Parylene N膜的光氧降解性能。
Poly (p-xylylene)s prepared by chemical vapor deposition (CVD) polymerization can be widely used in space technology, aeronautical engineering,ordnance industry, electronics, biomedicine, control system, preservation of antiques, nano materials, magnetic materials, etc. Mechanism and technology of poly (p-xylylene)s preparation by CVD polymerization are reviewed in this paper. Effects of substrate temperature and deposition chamber pressure on the deposition rate of the polymer are discussed. Main properties of parylenes are described, and the photo oxidation of typical parylene N is analysed.
出处
《材料导报》
EI
CAS
CSCD
2004年第3期54-56,53,共4页
Materials Reports
