热蒸镀镀膜机膜厚均匀性问题

THE FILM UNIFORMITY OF EVAPORATING PLATER

本文依据L.Holland的膜厚公式和I.A.Neil的关手光学元件表面的数学表达式讨论了热蒸镀形镀膜机的膜厚均匀性,计算了平面、球面。高次曲面载盘的膜厚分布。关于载盘形状得出了一些有意义的结论。并特别地计算了DM450C镀膜机的膜厚均匀性。

Acording L.Hallandjs formula about the thickness of plated film and Neiljs mathematica farmula about the surfaec of optiea element this paper discussed the unigarmity of film plateel by tvaporating plater, ealculatrd the thickness distsibution of cassying plates the shape of wich were plane, sphere, or to high power. For the shape of callying plate it ieached same signiqicant canelusions, at specially calcnlatcel the uniqormity of film thickness ptated by DM-450c exaporating ptater.