钇稳定氧化锆薄膜的制备及其微细加工

Preparation of Yttrium-Stabilized Zirconia Films and Their Fine Patterning

以甲醇为溶剂,硝酸氧锆、硝酸钇为前驱物,采用溶胶-凝胶方法,通过引入化学修饰剂乙酰丙酮(AcAcH),使乙酰丙酮和锆离子形成螯合物,得到了具有紫外光感光性的溶胶及其凝胶薄膜,提出了YSZ薄膜的微细图形加工新方法.UV-Vis.分光光度计的紫外光谱测试结果表明:乙酰丙酮与锆离子形成的螯合物在室温、可见光、大气环境下,可以存在于凝胶薄膜中,并具有较好的热稳定性和光化学稳定性,其紫外光谱的特征吸收峰大约在310nm附近;325nm紫外激光光源照射凝胶薄膜,能破坏、分解凝胶薄膜中的这种螯合物结构,使凝胶薄膜的物理化学性质发生变化,实验发现,经过紫外激光照射的凝胶薄膜在适当的有机溶剂(如甲醇等)中的溶解度和溶解速度显著降低,利用这一特性,采用325nm紫外激光通过掩膜照射凝胶薄膜,并在适当的有机溶剂中溶洗掉未受照射的区域,经过800℃,20min热处理,得到了具有微细图形的YSZ薄膜,XRD测试表明该薄膜相结构为立方相.

A novel technique was developed to lithographically make fine patterns on Y-stabilized zirconia films (YSZ films), using methanol as solvent, zirconium oxynitrate and yttrium nitrate as precursor, acetylacetone (AcAcH) as chemical modification. Basing on sol-gel process, an UV photosensitive sol and gel films by chemical modification in AcAcH to form chelate complexes with Zr ions, were obtained from which the YSZ films to be patterned can be prepared. By means of UV-Visible spectrophotometers, it was found that the chelate complexes with AcAcH bonded with Zr ions can exist in the gel films, and show good thermal stability and photochemical stability under the atmosphere and visible light and room temperature, and have a UV absorption peak located at around wavelength 310nm. The UV laser light with the wavelength of 325nm irradiation can decompose the chelate complexes in gel films, and change the physical and chemical characteristic of the gel films, from which the solubility of gel films irradiated by UV laser light in solvents including methanol, etc., is reduced remarkably. Utilizing such characteristics, YSZ films with fine patterns can be obtained by irradiating the gel film with UV laser light via pattern mask and dissolving the non-irradiated area in suitable solvent and annealing at 800degreesC for 20min. The results via XRD patterns test show that the YSZ fine pattern films are of cubic phase.