摘要
采用自制的高速喷射电沉积装置制备了块体纳米晶Co Ni合金 ,利用SEM、TEM、XRD及EDS等方法研究了电流密度对沉积速率、电流效率及Co Ni合金沉积层组织结构的影响 ,并与槽镀沉积层进行了对比。结果表明 :采用该方法后允许使用的极限电流密度、沉积速率及电流效率均显著增大 ,沉积速率高达 4 7 33μm/min,是一般槽镀的 90倍左右。随着电流密度的增加 ,沉积速率呈近似线性增加 ,但电流效率增大到一定值后基本不变。电流密度对沉积层成分影响不大 ,但明显减小沉积层的晶粒尺寸。与一般槽镀相比 ,晶粒尺寸由 2 3 0 7nm减小到 9 18nm。
A high speed jet-electrodepositing equipment was used to prepare nanocrystalline Co-Ni alloy. The influences of current density on depositing rate, current efficiency and microstructure of nanocrystalline Co-Ni alloy were studied by means of SEM, TEM, XRD and EDS, and compared with that of conventional electroplating. The results show that the limit current density, the depositing rate and current efficiency increase remarkably, the depositing rate reaches to 47.33μm/min, which is about 90 times as that of conventional deposition. A linear increasing of the deposizing rate with the increase of current density is observed, but current efficiency increases to a certain value and then gets invariability. The current density has little effect on the chemical composition of deposition layer, but it refines grain size obviously. The grain size decreased from 23.06nm to 9.18nm compared with conventional deposition.
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2004年第1期61-65,共5页
Transactions of Materials and Heat Treatment
基金
河北省自然科学基金 (5982 50 )
燕山大学科技发展基金资助
