控制真空镀膜蒸发速率的微处理机

A Microprocessor to Control Deposition Rate in Vacuum Evaporation

本文报道了在本实验室制作并开始使用的控制真空蒸发速率的微处理机(单板机)。它利用石英晶体振荡器为探测器,将该振荡器随膜厚不同而频率变化的交流信号反馈到微中心处理器。中心处理器将这交流信号和预期的蒸发速率比较,利用其差去控制给蒸发源的功率。该处理机具有结构简单、制作容易、蒸发速度可以控制在4％的程度范围内等优点。另外,如与微机联用其蒸发速度可以自动记录。制造或使用数字式频率计的工厂、实验室如能利用或参考该机的原理、线路图,将在不增加很多费用的前提下,使仪器性能更完美,更实用。

Deposition rate for preparing a film by vacuum evaporation, is one of the most important parameters affecting the resulting film properties. This paper describes a deposition rate controller which uses a microprocessor. It uses simple circuitry which can be fabricated and operated easily. when it is used together with a personal computer, the actual deposition rate can be recorded numeriaclly. It has been used to deposit a—Si, while the rate was held at presetting value of 10 nm/min. with an accuracy of 4％, The electronic circuit the relevant software and the operating procedure is discussed in detail in this paper.