新型水溶性含季铵碱基感光树脂的合成及性能

SYNTHESIS AND PROPERTIES OF WATER SOLUBLE PHOTOSENSITIVE QUATERNARY AMMONIUM HYDROXIDE GROUPS CONTAINING PHENOLIC RESIN

研究了作为新型水显影阻焊剂的含丙烯酸酯基及季铵盐基的酚醛树脂用碱的醇溶液改性成为水溶性的含季铵碱基及丙烯酸酯基的酚醛树脂的反应条件,并研究了对其感光性能的影响,用TGA测定季铵离子基热分解温度。结果指出,改性转化率可达90%,产物保持水溶性,而其离子热分解温度明显下降至120℃,但感光性能有一些下降。

Phenolic resin containing quaternary ammonium hydrochloride groups and acrylate groups(AQCPR) was modified by reaction with KOH in methanol solution into phenolic resin containing quaternary ammonium hydroxide groups and acrylate groups(AQHPR). Various reaction conditions were studied. Conversion of quaternary ammonium hydrochloride groups can reach about 90%. Thermal decomposition temperatures of the resin before and after modification were determined by thermal gravimetric analysis and it was shown that the thermal decomposition temperature of quaternary ammonium ion groups is lowered to 120 ℃ after modification. This fact is beneficial to the post hardening and to the insulating properties of the soldering mask. Photocrosslinking of the soldering mask containing the modified resin(AQHPR) were compared with AQCPR. It was shown that the photosensitive property of the resin after modification are somewhat poorer than that before modification.