摘要
Ni 0.81Fe 0.19) 0.66Cr 0.34 has a high resistivity and a crystal structure close to that of Ni 0.81Fe 0.19.The electrical and X-ray diffraction measurements prove that a thin NiFeCr seed layer induces a well (111)-oriented Ni 0.81Fe 0.19 film.Post-annealing treatment improves the magnetic properties of (Ni 0.81Fe 0.19) 0.66Cr 0.34(45?)/Ni 0.81Fe 0.19(150?)/Ta(55?) thin film prepared under a deposition field,whereas the inter-diffusion of NiFe/Ta deteriorates the magnetoresistance properties of the film.
Ni 0.81Fe 0.19) 0.66Cr 0.34 has a high resistivity and a crystal structure close to that of Ni 0.81Fe 0.19.The electrical and X-ray diffraction measurements prove that a thin NiFeCr seed layer induces a well (111)-oriented Ni 0.81Fe 0.19 film.Post-annealing treatment improves the magnetic properties of (Ni 0.81Fe 0.19) 0.66Cr 0.34(45?)/Ni 0.81Fe 0.19(150?)/Ta(55?) thin film prepared under a deposition field,whereas the inter-diffusion of NiFe/Ta deteriorates the magnetoresistance properties of the film.
基金
FundedbytheNaturalScienceFoundationofHubeiProvince(No .2 0 0 2AB0 32 )
