基体负的低偏压对氟化非晶态碳膜结构及性能的影响

Influence of Substrate Bias on Growth of Amorphous Fluorinated Carbon Films

为了研究基体负的低偏压Vb 对氟化非晶态碳膜的结构、纳米硬度和疏水性能的影响 ,采用等离子体浸没与离子注入装置 ,CF4和CH4作为气源 ,在不同的基体偏压下制备了一系列氟化非晶态碳膜。使用XPS、ATR FTIR和Raman谱对其成份和结构进行了表征。薄膜硬度通过纳米压痕仪进行测量 ,采用躺滴法测量薄膜与双蒸水之间的接触角来评价其疏水性能。XPS和FTIR结果表明薄膜中存在C CF、C Fx基团。Raman谱结果表明 :随着基体偏压的增加 ,薄膜从类聚合物状结构逐渐转变为类金刚石结构 ,薄膜的硬度逐渐增加。接触角测量结果表明 :在低偏压范围内 。

Amorphous fluorinated carbon(a C∶F) films were grown on Si(100) substrate with plasma immersion ion implantation(PIII) in a mixture of CH 4 and CF 4 gases to study the influence of substrate bias voltage on various properties of the film,including its microstructures,its nano hardness and its hydrophobic properties.The film was characterized with X ray photoelectron spectroscopy(XPS),attenuated total reflection Fourier transform infrared spectroscopy(ATR FTIR),Raman spectroscopy and nano indentation of CSEM.XPS and IR spectra reveal the existence of large amount of C CF and C F x groups in the films.Raman spectra show that as substrate bias goes further negative,the film texture changes from polymer like into diamond like films;meanwhile its hardness also increases.The contact angle measurement shows that merely varying the substrate bias voltage fails to improve the hydrophobic properties of the film.