摘要
电子回旋共振 (ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。利用朗谬尔探针对ECR等离子体进行了初步的诊断研究 ,测量了等离子体的单探针伏安特性并计算出电子温度 ,电子密度和等离子体电势等参量。实验证明 ,ECR等离子体源能够稳定地产生电子温度较低的高密度等离子体。
Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system.The I V characteristics of the probe were measured and various physical quantities of the plasma,such as its electron temperature,its electron density and its plasma potential,were calculated.The results show that the ECR plasma source may generate stable,high density plasma with low electron temperature.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2004年第1期71-73,共3页
Chinese Journal of Vacuum Science and Technology