期刊文献+

不同波段近紫外光在SU-8胶中穿透深度的研究 被引量:2

Research of Penetration Length of Near Ultraviolet in SU-8 Layers
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摘要 通过对SU 8胶近紫外波段下透射光谱的分析,得到不同波长近紫外光在SU 8胶中的穿透深度,并分析了不同波段近紫外光对SU 8胶微结构的影响,结果表明穿透深度大的近紫外波段曝光出来的图形质量好,深宽比大,侧壁陡直。 The transmission spectrum of the SU-8 photoresist in the near UV is analyzed to get the penetration length of the different wavelengths UV in SU-8.The effect on the SU-8 microstructure for the different wavelengths UV is also analyzed.The results show that the pattern exposured by the near UV band of deep penetration has good quality,high aspect ratio and steep sidewall.
出处 《微细加工技术》 2004年第1期38-40,46,共4页 Microfabrication Technology
关键词 紫外光 SU-8胶 穿透深度 MEMS UV-UGA 透射光谱 光刻胶 penetration length SU-8 photoresist MEMS UV-LIGA
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参考文献5

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同被引文献23

  • 1杨承,黄成军,刘锋,于军.毛细管电泳芯片制备工艺研究[J].华中科技大学学报(自然科学版),2004,32(7):92-94. 被引量:2
  • 2周小棉,戴忠鹏,罗勇,刘大渔,王辉,毛秀丽,林炳承.注塑型聚甲基丙烯酸甲酯多通道微流控芯片的研制及其性能考察[J].高等学校化学学报,2005,26(1):52-54. 被引量:10
  • 3李建华,陈迪,刘景全,朱军.微流控芯片金属模具制备工艺研究[J].微细加工技术,2005(4):56-58. 被引量:5
  • 4肖日松,杜立群,刘冲,刘海军,秦江.基于MEMS技术的微型模具制作工艺研究[J].高技术通讯,2006,16(4):368-371. 被引量:8
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