准分子激光诱导沉积锰和钨薄膜

Excimer laser-induced deposition of manganese and tungsten thin film

用波长为308nm XeCl准分子激光辐射光解羰基锰二聚物Mn_2(CO)_10和羰基钨W(CO)。沉积锰和钨薄膜,研究了实验参量与薄膜特性之间的关系。

We report here in the deposition of manganese and tungsten thin films by 308nm XeCl excimer laser induced photolys is of manganese pentacarbonyl dimer Mn2 (CO) 10 and tungsten hexacarbonyls W(CO)6 respectively. The dependence of the features of the thin film on the; experimental parameters has been studied.