摘要
在2003年11月28~31日于日本YoKohama举办的FPD展览会上展示了最大尺寸的a-Si淀积基板,这种基板可满足在一块基板上生产40英寸电视的要求。从而表明大尺寸TFT-LCD电视的新纪元正在来临。从原理、系统结构、基板传输(外部和内部)、工艺概述了用于TFT-LCD生产线的第6代和第7代PECVD和PVD系统的腔室等方面新技术方案。讨论了用于TFTLCD生产的PECVD和PVD系统的未来趋势。
The biggest a-Si deposited substrate was introduced by Unaxis Displays at Yokohama FPD exhibition held on November, 28 - 31, 2003. This substrate enables up to eight 40' televisions to be produced on one substrate, thus indicating the new era of large size TFTLCD television is coming. This present paper outlines the innovative solution of PECVD and PVD systems (Generation 6 and 7) used for TFT-LCD production line: - Concept - System configuration - Substrate handling (external and internal) - Process reactors ~ chamber Finally, the future trend of PECVD & PVD system used for TFT LCD production is discussed.
出处
《电子工业专用设备》
2004年第4期26-28,共3页
Equipment for Electronic Products Manufacturing