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热处理对Y_2O_3:Eu荧光薄膜结晶性能的影响

Crystal property of Y_2O_3:Eu thin film improved by post-deposition heat treatment
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摘要 运用热处理方法对电子束蒸发制备的Y2O3:Eu荧光薄膜进行不同条件下的退火处理.用X射线衍射等手段表征Y2O3:Eu荧光薄膜的成分、结构、表面形貌.实验表明随着温度的升高,薄膜的结晶状况得到改善,提高了薄膜的结晶性能. Y_2O_3:Eu thin films ,which have been grown on ITO substrated by electron beam evaporation, are annealed in different conditions. The construction and ingredient of the Y_2O_3:Eu thin films are used X-ray diffraction and XPS. It was found that the post-deposition annealing at 400℃ and 600℃ improved the crystal properties of Y_2O_3:Eu thin films respectively.
出处 《天津理工学院学报》 2004年第1期20-23,共4页 Journal of Tianjin Institute of Technology
基金 天津市自然科学基金资助项目(013615211) 天津市教委资金资助项目(01 20114) 天津市"材料物理与化学"重点学科资助项目
关键词 热处理 荧光薄膜 结晶性能 Y2O3:Eu 退火 FED 显示材料 场发射显示器 heat treatment Y_2O_3:Eu thin films crystal properties annealing process FED
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参考文献6

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