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软X射线偏振光学元件的设计与制备 被引量：4

Design and fabrication of polarizing optical element in the soft X-ray range
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摘要 叙述了软X射线波段反射式多层膜起偏器和检偏器的设计原则和设计方法,优化计算了5.9nm波长处多层膜光学元件的偏振性能,阐述了其制备的过程,利用小角度衍射法对多层膜的厚度进行了测量,并对同步辐射测量的反射率结果进行了拟合分析。 The conditions for optimum polarization of reflective multilayered polarizers and analyzers in the soft X-ray range are given. The performances of reflection polarized components are optimized in 5.9nm,and the progress of the fabrication is present. The small angle diffraction method is used to measure the thickness of multilayer, and the reflectivity measured by synchrotron radiation is fit and analyzed.
作者 王洪昌 王占山 吴文娟 王风丽 张众 秦树基 陈玲燕
机构地区 同济大学精密光学工程技术研究所
出处 《光学仪器》 2004年第2期143-146,共4页 Optical Instruments
基金 国家自然科学基金资助项目(60178021) 上海市科技攻关项目(022261049)
关键词 软X射线 偏振 光学元件 设计 制备 多层膜 拟合 soft X-ray polarization multilayer fitting
分类号 O484.41 [理学—固体物理] O436.3 [机械工程—光学工程]
  • 相关文献

参考文献8

  • 1Soufli R, Spiller E A, Schmidt M A, et al..Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution[J].SPIE, 2001, 4343:51-59.
  • 2Ohchi T, Fujimoto T,Kojima I.Cr/Sc multilayer mirror for soft X-ray [J].Analytical Sciences,2001,17(Supplement):159-162.
  • 3Schafers F, Mertins H, Gaupp A, et al..Soft X-ray polarimeter with multilayer optics: complete analysis of polarization state of light[J]. Appl Opt,1999, 38(19):4074-4088.
  • 4Yamamoto M, Mayama K, Kimura H, Furudate M,Yangagihara M, The first thin film ellipsometry at a photo energy of 97eV with use of high performance multilayer polarizers[J].SPIE, 1996, 2873:70-73.
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  • 6Bevington P R. Data Reduction and Error Analysis for the Physical Sciences[M].New York:McGraw-Hill,1969,58-64.
  • 7王洪昌,王占山,李佛生,陈玲燕,朱杰,崔明启.软X射线多层膜反射式偏振光学元件设计[J].光学技术,2003,29(3):277-280. 被引量：8
  • 8王洪昌,王占山,秦树基,李佛生,陈玲燕,朱杰,崔明启.软X射线Mo/Si多层膜反射率拟合分析[J].光学学报,2003,23(11):1362-1365. 被引量：14

二级参考文献16

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  • 3Soufli R, Spiller E A, Schmidt M A, et al. Multiphyer optics for an extreme-ultraviolet lithography tool with 70-nm resolution [J ].Proc. SPIE, 2001, 4343:51--59.
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  • 6Yamamoto M, Mayama K, Kimura H, Furudate M, Yangagihara M. The first thin film ellipsometry at a photo energy of 97ev with use of high performance multiplayer polarizers [ J ]. Proc. SPIE,1996, 2873: 70---73.
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共引文献19

同被引文献28

  • 1Torsten Feigl,Sergiy Yulin,Nicolas Benoit,Norbert Kaiser.Multilayer optics for the EUV and soft X-rays[J].光学精密工程,2005,13(4):421-429. 被引量：4
  • 2张众,王占山,王洪昌,王风丽,吴文娟,张树敏,秦树基,陈玲燕.13.9nm马赫贞德干涉仪用软X射线分束镜研究[J].强激光与粒子束,2006,18(5):773-778. 被引量：3
  • 3E. Spiller. Soft X Ray Optics [M]. Bellingham: SPIE Optical Engineering Press, 1994.
  • 4J. B. Kortright, M. Rice, S. K. Kimetal.. Optics for element resolved soft X-ray magneto optical studies[J]. J Magnetism and Magnetic Materials, I999, 191:78-89.
  • 5D. G. Stearns. The scattering of X rays from nonideal multiplayer structures[J]. J. Appl. Phys., 1989, 65(12):491-506.
  • 6H. Grimmer, P. Boni, U. Breitmeier. X ray reflectivity of multilayer mirrors for the water window[J]. Thin Solid Films,1998, 319:73-77.
  • 7David 1.. Windt, Eaic M. Gulliksom, Christopher C. Walton.Normal-incidence reflectance of optimized W/BIC X-ray multilayers in the range 1. 4 nm<λ<2. 4 nm[J] Opt. Lett ,2002, 27(24): 2212-2214.
  • 8H. J. Voorma, E. I.ouis, N. B. Kosteret al.. Characterization of multilayers by Fourier analysis of X ray reflectivity[J]. J.Appl. Phys. , 1997, 81(9):6112-6119.
  • 9Muamer Zukic, Jongmin Kim, Michele Wilson et al.. Nongrazing high reflective narrowband multilayer X-ray coatings[C].Proc SPIE, 1993, 2011:322-333.
  • 10Tadayuki Ohchi, Toshiyuki Fujimoto, lsao Kojima. Cr/Sc multilayer mirror for soft X ray[J]. Analytical Sciences, 2001,17(Suppl.): 159-162.

引证文献4

二级引证文献7

光学仪器
2004年 第2期

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