应用于MOEMS器件的K9玻璃湿法刻蚀工艺的研究

Research on K9 glass wet etching for MOEMS devices

介绍了以K9玻璃为基体材料MOEMS器件的湿法刻蚀工艺。选择了光刻胶,铬,氮化硅,ITO等多种材料作为基底材料抗腐蚀的掩膜,利用多种不同成分的刻蚀剂进行了对比刻蚀试验,研究了刻蚀环境温度对保护膜的影响。对比与分析了多种试验结果并对其适用范围进行了适当的评价。

Wet etching for MOEMS devices based on K9 glass substrate is demonstrated. Several kinds of materials, photoresist, Chromium, Si_3N_4 and ITO are applied as the anti-erode mask of the wet etching. A series of comparable experiments are done to observe the etching effects with different etching solutions, at the same time the effect of different etching temperature is investigated and studied experimentally. The results are also compared and analyzed to determine the scope of applications of different etching solutions and etching mask materials.