摘要
采用化学还原工艺,在CO2与H2混合气氛下对LN和LT晶片分别进行700°C和450°C退火处理,成功地制备了LN和LT黑色晶片。静电位差、光透过率测量结果表明,还原处理后LN和LT晶片的热释电现象基本消失,其光透过率也显著降低。居里温度测试表明,还原处理对晶体的居里温度没有影响。
Free-pyro black LiNbO_3 and LiTaO_3 wafers were prepared successfully by chemical reduction at (700 °C) and 450 °C respectively under a mixed atmosphere of CO_2 and H_2. Bulk conductivity and optical transmittance of the wafers were measured. The results showed that the pyroelectric effect for the reduced wafers was almost eliminated and the transmittance decreased considerably. The reduction process did not change Curie temperatures of LN and LT wafers
出处
《压电与声光》
CSCD
北大核心
2004年第2期126-128,共3页
Piezoelectrics & Acoustooptics
