期刊文献+

钌基厚膜应变电阻力敏模型的初始讨论(英文)

Inchoate Discussion of Ru-Based Thick Film Strain Resistor's Strain Sensitive Model
下载PDF
导出
摘要 通过分析钌基厚膜应变电阻的隧道势垒模型,提出力敏模型。用Bi_2O_3和RuO_2合成Bi_2Ru_2O_7并进行试验,发现应变系数随导电相粒径的增大而增大。用力敏模型解释了这一现象,并解释了其他力敏现象,诸如应变系数随势垒高度的增大而增大。 We constructed a strain sensitive model through the analysis of the Ru-based thick film strain resistor's tunneling barrier model. Bi2Ru2O7 was synthesized with Bi2O3 and RuO2 . The gauge factor (GF) aggrandizes with the conductive particles radius' accretion. We interpreted this phenomenon through the strain sensitive model, and explained the other strain sensitive phenomenon, such as the GF mounts up with the barrier height' s augmention.
作者 丁鹏 马以武
出处 《电子器件》 CAS 2004年第1期63-65,82,共4页 Chinese Journal of Electron Devices
基金 The project is supported by NSFC,granted.(NO.60175927,60374050)
关键词 厚膜应变电阻 力阻模型 隧道势垒模型 thick film strain resistor strain sensitive model tunneling barrier model
  • 相关文献

参考文献10

  • 1Ponnusamy Palanisamy, Dwadasi H.R. Sarma and Robert W.Vest J Am Ceram Soc[J]. 1985,68(5) :249 - 53.
  • 2Ding Peng, Ma Yiwu, Electron Devices[J]. 2003, (3):264- 269.
  • 3Ma Yiwu, Song Jian, Chang Huimin, Wang Yingxian. Function Materials[J]. 1998,10:650 - 652.
  • 4Holmes P J. Microelectronic Reliab[J]. 1973, 13:395 - 6.
  • 5Pike G E and Seager C H. J Appl Phys[J]. 1977,48( 12):5152 - 5169.
  • 6Semiconductors[ M]. edited by N. B. Hannary, Reinhold, New York, 1959.
  • 7Zhang Yuheng. superconductivity[ M]. The USTC publishing company, 435 - 438.
  • 8W.r. Smyth.static and Dynamic Electricity[M]. (McGrawHill, New York, 1968).
  • 9P.F.Carcia, A.Suna, and W.D.Childers. J Appl Phys[J].1983,54(10): 6002 - 6008.
  • 10Canali C, Malavasi D, Morten B, Prudenziati M, and Taroni A. J Appl Phys [J]. 1980,51(6) :3282 - 3288.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部