连续CVD Nb_3Sn层生长的规律及特征的研究

THE REGULARITIES OF GROWTH OF THE CONTINUOUS CHEMICAL VAPOR DEPOSIT (CVD) Nb_3Sn LAYER

本文讨论了连续CVD Nb_3Sn层沉积速率与生产速率或带速之间的关系。研究了一定工艺条件下连续CVD层厚与沉积时间的线性生长关系和过渡层厚形成的抛物线规律与Nb_3Sn层生长的特征。

In this paper the relationship will be discussed between the deposition rate and tape rate during the continuou CVD of Nb_3Sn. A analysis will be made on the linear relationship of thickness of the continuous CVD Nb_3Sn layer to deposit time, the parabolic relationship of transitional layer thickness to deposition time, and the growth characteristics under a given deposition condition.