摘要
研究了多孔硅衬底微波 CVD金刚石薄膜的制备工艺及其场电子发射特性 .以多孔硅作为生长金刚石突起阵列的模板 ,生长出带多微尖的微晶金刚石晶粒 ,使场电子发射阈值下降 (<1V/ μm) ,发射电流增大 (>90 m A/ cm2 ) ,场发射性能稳定 ,并对这种场发射特性做出了理论解释 .
Preparation and field electron emission of diamond films grown on porous silicon substrates by MW-CVD are studied.Microcrystalline diamond particles with multi-microtips are deposited on porous silicon templates and formed an nanocrystalline diamond protuberance array,which results in reduced (<1V/μm) field electron emission threshold and increased (>90mA/cm2) emission current.Therefore nanocrystalline diamond films have a fine stability of field emission.A possible theoretical explanation to the characteristic of field emission is discussed.
关键词
多孔硅
金刚石薄膜
场电子发射
porous silicon
diamond films
field electron emission
