摘要
提出并实现了以分段分类思想为基础的掩模版优化算法 ,它是一种基于模型的光学邻近效应方法 .该算法具有矫正精度高、灵活性强和矫正效率较高的特点 ,适合于版图中关键图形的矫正 .实验表明 ,该优化算法可以实现矫正功能并且具有很好的矫正效果 .
The layout correction and optimization algorithm are presented based on the model-based OPC.The algorithm has such merits as high accuracy of correction,high adaptability,and high efficiency,which make it very appropriate to be used in critical features on layout.Tests show this algorithm can successfully deal with correction and with good correction result.
