摘要
解释了氟化钙晶体能被应用在光刻系统和掀起研究热潮的原因,概述了氟化钙晶体的研究和发展现状,指出了目前氟化钙晶体在研究和发展过程中要解决的重要问题和措施,最后对氟化钙晶体在光刻系统中的发展前景作了展望.
The reasons why calcium fluoride crystals can be used in lithography system were explaned. The research and development status of calcium fluoride crystals was summarized. Meanwhile the important problems need to be resolved in the process and measures that should be taken into consideration were pointed out. In the end the development foreground was expected.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2004年第3期449-455,共7页
Journal of Inorganic Materials
基金
上海市科技发展基金(022261053)