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光刻系统用氟化钙晶体的研究进展 被引量:3

Research and Development Status of Calcium Fluoride Crystals Used in Lithography System
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摘要 解释了氟化钙晶体能被应用在光刻系统和掀起研究热潮的原因,概述了氟化钙晶体的研究和发展现状,指出了目前氟化钙晶体在研究和发展过程中要解决的重要问题和措施,最后对氟化钙晶体在光刻系统中的发展前景作了展望. The reasons why calcium fluoride crystals can be used in lithography system were explaned. The research and development status of calcium fluoride crystals was summarized. Meanwhile the important problems need to be resolved in the process and measures that should be taken into consideration were pointed out. In the end the development foreground was expected.
出处 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2004年第3期449-455,共7页 Journal of Inorganic Materials
基金 上海市科技发展基金(022261053)
关键词 氟化钙 晶体 紫外 光刻 157nm 半导体 calcium fluoride crystal UV lithography semiconductor
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参考文献20

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共引文献1

同被引文献37

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