摘要
采用磁控溅射技术在用浸渍提拉法制得的TiO2薄膜上,溅射氧化钨层,通过气相反应中光催化降解二甲苯的实验表明,WOx/TiO2薄膜具有可见光活性.通过UV-Vis吸收光谱、X射线光电子能谱(XPS)等方法对其可见光活性的机理进行探索.UV-Vis吸收光谱表明WOx,TiO2对可见光响应的范围有一定的扩展,吸收强度增加.XPS表明WOx/TiO2薄膜表面形成了明显的W杂质能级和Ti缺陷能级,这是WOx/TiO2在可见光范围有一吸收的主要原因,也是光催化剂具有可见光活性的必要条件之一,同时杂质能级的存在使半导体费米能级上移,载流子增加,光催化效率提高.
The TiO2 thin films from dip coating system were magnetron sputtered on with WOx,and can be activated by visible light in gaseous dimethyl benzene photocatalytic degradation.The mechanism of its visible light activity was investigated by UV Vis absorption spectra and X ray photoemission.UV Vis absorption spectra showed its visible light response expanding and having strong absorption with respect to the pure TiO2 film.XPS indicated the formation of W impurity energy level and Ti defect energy level,which was the main reason for the absorption in the visible light range and the perquisite to have visible light activity;and made Fermi level upper moved,free carriers more and photocatalytic efficiency enhanced.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
2004年第5期507-511,共5页
Acta Physico-Chimica Sinica
基金
广东省自然科学基金(010873)
广东省科技计划(A3040301)资助项目~~
