摘要
研究在铝合金表面多弧离子镀(Ti,Cr)N膜的工艺可行性.利用正交试验确定最佳工艺参数,讨论靶材成分、沉积时间、偏压、氮气压力和弧电流对膜层性能和质量的影响,并对该膜层的耐蚀性能和摩擦学性能进行了研究.结果表明,铝合金表面可以沉积(Ti,Cr)N膜.当靶材成分为w(Ti)=80%,w(Cr)=20%,沉积时间为30min,偏压为200V,氮气压力为3.0Pa,弧电流为75A时,可得到膜基结合力为44N,膜厚为1.77μm的(Ti,Cr)N膜.
The feasibility of depositing (Ti,Cr)N film on LY12 aluminum substrate is studied and the parameters involved are optimized by orthogonal-design optimization tests. The chief deposition parameters in multi-arc (Ti,Cr)N film processes include the target composition, deposition time, bias voltage, partial pressure of nitrogen and arc current, concerning their influences on the film performance and quality. Corrosive resistance and frictional characteristics of the film are studied. With the deposition parameters: target component w (Ti)=80%, ( w (Cr)=)20%, deposition time 30 min, bias voltage 200 V, N_2 partial pressure 3.0 Pa and arc current (75 A,) the resulting (Ti,Cr)N film deposited on LY12 aluminum substrate has a binding force of (44 N) and a film thickness of 1.77 μm.
出处
《北京理工大学学报》
EI
CAS
CSCD
北大核心
2004年第4期286-289,共4页
Transactions of Beijing Institute of Technology
基金
国家部委预研项目(20010921)
