摘要
利用全息-离子束刻蚀方法研制出了聚酰亚胺薄膜为衬底的金软X射线透射光栅.研究了光栅制作中曝光量、显影条件和离子束刻蚀工艺等因素对光栅参数的影响,并给出了在惯性约束激光核聚变实验研究中的应用结果,
Soft X-ray gold transmission grating with polyimide membrance substrate is fabricated by holograph-ion beam etching technique. The exposure, development and etch conditions for fabricating grating are investigated and its experimental results used in inertial confinement fusion are given in this paper.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1992年第9期825-829,共5页
Acta Optica Sinica
关键词
离子束刻蚀
软X射线
透射
光栅
ion beam etching, soft X-ray transmission grating.