电感耦合等离子体质谱法测定高纯镓中痕量元素

INDUCTIVE COUPLING PLASMA MASS-SPECTROMETRIC METHOD OF DETERMINING THE TRACE ELEMENT IN HIGH-PURITY GALLIUM

探讨了电感耦合等离子体质谱仪 (ICP -MS)测定高纯镓中痕量元素的新技术 ,实验采用气固反应原理分离镓主体 ,富集杂质元素 ;采用 10ng/mlRh和Sc为双内标补偿校正镓基体的抑制效应 ,采用碰撞室 (CCT)技术消除多元素分子离子的干扰 ;使分离富集技术与ICP -MS技术联用 ,可满足 99.9999%超高纯镓的分析要求。方法的检出限 0 .0 0 1～ 0 .0 1μg/L ,加标回收在 90 .6 %～ 111.1%之间 ,RSD为 0 .2 7%～ 7.0 0 %。

The article discussed the new technology of using inductive coupling plasma mass-spectrometric method to determine the trace element in high-purity gallium.In test,gas-solide reaction theory was used to separate gallium and concentrate impurity.It used 10ng/mlRh and Sc to compensate the depression effect,used CCT to eliminate the interference of multi-element molecule and ion.In combination with separation and concentration and ICP-MS,the analysis requirement of ultra-purity gallium can be met.The detection limit is 0.001～0.01μg/L,mark collection is 90.6%～111.1%,RSD is 0.27%～7.00%.