用于制备纳米多层膜的金属掩膜法的研究

Study on metallic mask method for preparing nano-multilayers

简介了现有金属腌膜法制备纳米多层膜的过程,指出采用定位图形套准模板存在的弊端,研制出采用定位框固定基片、套准模板的制备新方法及装置。试验表明,采用该方法可显著提高制备纳米多层膜的完好率及套准精度。

The existing process of preparing nano - multileyers using metallic mask method is briefly introduced, the short- comings of aligning patterns using located figures were pointed out. A new preparing way and divice was given out. The testing results show that the intact rate of nano - multilayers and the aligning accuracy were improved obviously by adopting the way.