Si基光电子学的研究与展望

Study and prospect of Si-based optoelectronics

Si基光电子学是为顺应二十一世纪以现代光通信和光电子计算机为主的信息科学技术发展需要,在全世界范围内迅速兴起的一个极为活跃的研究前沿。其最终目标之一是为了实现人们所期盼的全Si光电子集成电路。本文尝试性地评论了这一集Si材料技术、纳米技术、微电子技术以及光电子技术为一体的新型交叉学科,近年来在直接带隙Si基低维材料的设计、晶粒有序Si基纳米材料的制备与稳定高效Si基发光器件的探索等方面所取得的若干重要研究进展,并预测了全Si光电子集成技术的未来发展趋势。

Si-based optoelectronics is becoming a very active research area due to its potential applications for optical communications. One of the major goals of this study is to realize all-Si optoelectronic integrated circuit. We mainly reviewed the current developments of this exciting field in the recent years. The involved contents indude the design of direct bandgap Si-based low dimensional materials, fabrication of ordered Si-based nanocrystalline films and approach of stable and high-efficient Si-based light-emitting devices. Finally, we predicate the developed tendency of all-Si optoelectronic integrated technology in the near future.